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|Title:||The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers|
|Authors:||Pershyn, Y. P.|
Gullikson, E. M.
Artyukov, I. A.
Kondratenko, V. V.
Sevryukova, V. A.
Voronov, D. L.
Zubarev, E. N.
Vinogradov, A. V.
|Keywords:||multilayer X-ray mirror; interlayer composition; pressure variation; magnetron sputtering|
|Publisher:||American Institute of Physics|
|Citation:||The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers / Y. P. Pershyn [et al.] // SPIE. – 2011. – Vol. 8139m. – P. 0N1-0N11.|
|Abstract:||Impact of Ar gas pressure (1−4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering (l=0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers|
|Appears in Collections:||Кафедра "Фізика металів і напівпровідників"|
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