Please use this identifier to cite or link to this item: http://repository.kpi.kharkov.ua/handle/KhPI-Press/4716
Title: The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
Authors: Pershyn, Y. P.
Gullikson, E. M.
Artyukov, I. A.
Kondratenko, V. V.
Sevryukova, V. A.
Voronov, D. L.
Zubarev, E. N.
Vinogradov, A. V.
Keywords: multilayer X-ray mirror; interlayer composition; pressure variation; magnetron sputtering
Issue Date: 2011
Publisher: American Institute of Physics
Citation: The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers / Y. P. Pershyn [et al.] // SPIE. – 2011. – Vol. 8139m. – P. 0N1-0N11.
Abstract: Impact of Ar gas pressure (1−4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering (l=0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers
URI: http://repository.kpi.kharkov.ua/handle/KhPI-Press/4716
Appears in Collections:Кафедра "Фізика металів і напівпровідників"

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