Please use this identifier to cite or link to this item: http://repository.kpi.kharkov.ua/handle/KhPI-Press/4787
Title: Effect of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers
Authors: Pershyn, Yuriy P.
Gullikson, Eric M.
Kondratenko, Valeriy V.
Mamon, Valentine V.
Reutskaya, Svetlana A.
Voronov, Dmitriy L.
Zubarev, Evgeniy N.
Artyukov, Igor A.
Vinogradov, Alexander Vladimirovich
Keywords: subject terms; x-ray multilayer mirrors; interfaces; composition; pressure influence; silicides
Issue Date: 2013
Publisher: SPIE
Citation: Effect of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers / Y. P. Pershyn [et al.] // Optical Engineering. – 2013. – Vol. 52 (9). – p. 095104-1-10.
Abstract: By methods of cross-sectional transmission electron microscopy and small-angle x-ray scattering (λ = 0.154 nm) the influence of Ar gas pressure (1 to 4 mTorr) on the growth of amorphous interfaces in Mo/Si multilayers (MLs) deposited by DC magnetron sputtering is studied. The significant reduction in the ML period, which is evident as a volumetric contraction, is observed in MLs deposited at Ar pressure where the mean-free path for the sputtered atoms is comparable with the magnetronsubstrate distance. Some reduction in the thickness of the amorphous interlayers with Ar pressure increase is found, where the composition of the interlayers is enriched with molybdenum. The interface modification resulted in an increase in EUV reflectance of the Mo/Si MLs
URI: http://repository.kpi.kharkov.ua/handle/KhPI-Press/4787
Appears in Collections:Кафедра "Фізика металів і напівпровідників"

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