Please use this identifier to cite or link to this item: http://repository.kpi.kharkov.ua/handle/KhPI-Press/53858
Title: Behavior of the Ti-Zr-Ni thin film containing quasicrystalline and approximant phases under radiative-thermal action in transition modes
Authors: Malykhin, S. V.
Makhlai, V. A.
Surovitskiy, S. V.
Garkusha, I. E.
Herashchenko, S. S.
Kondratenko, V. V.
Kopylets, I. A.
Zubarev, E. N.
Borisova, S. S.
Fedchenko, A. V.
Keywords: radiative-thermal action; thin film; quasicrystalline phase; X-ray diffraction; hydrogen plasma; heat load
Issue Date: 2020
Publisher: Kharkiv Institute of Physics and Technology
Citation: Behavior of the Ti-Zr-Ni thin film containing quasicrystalline and approximant phases under radiative-thermal action in transition modes / S. V. Malykhin [et al.] // Problems of atomic science and technology. – 2020. – No. 2 (126). – 6 p.
Abstract: X-ray diffraction and SEM microscopy were used to study the structural and phase changes in a thin film obtained by magnetron sputtering of a Ti52Zr30Ni18 target (at.%) on a steel substrate under the radiation-thermal influence of pulsed hydrogen plasma on an QSPA Kh-50 accelerator. A technique has been worked out for the formation of the quasicrystalline and crystal-approximant phases as a result of high-speed quenching using pulsed action with a heat load of 0.6 MJ/m². The changes in the contents of these phases as well as in their structure and substructure parameters were studied during isothermal vacuum annealing at a temperature of 550 °C and also as a result of irradiation with 5 plasma pulses in the range of heat load from 0.1 to 0.4 MJ/m². The quasicrystalline phase was found to be resistant to irradiation with hydrogen plasma.
URI: http://repository.kpi.kharkov.ua/handle/KhPI-Press/53858
Appears in Collections:Кафедра "Фізика металів і напівпровідників"

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