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Title: Thermoresistive multilayer mirrors antidiffusion barriers for work at the wavelengths 40-50nm
Authors: Voronov, Dmitriy L.
Zubarev, Evgeniy N.
Kondratenko, Valeriy V.
Penkov, Alexey V.
Pershin, Yuriy P.
Ponomarenko, Alexander G.
Artioukov, Igor A.
Vinogradov, Alexander V.
Uspenskii, Yuriy A.
Keywords: thermal stability of Si/Sc; multilayer mirrors; X-ray scattering; термічнf стабільнsстm Si/Sc; багатошарові дзеркала; pозсіювання рентгенівських променів
Issue Date: 2002
Publisher: American Institute of Physics
Citation: Thermoresistive multilayer mirrors antidiffusion barriers for work at the wavelengths 40-50nm [Electronic resource] / Dmitriy L. Voronov [et al.] // AIP Conference Proceedings. – 2002. – Vol. 641.: 8th International Conference on X-Ray Lasers, Aspen, Colorado, 27-30 May 2002 / edited by J. J. Rocca [et al.]. – Electronic text data. – Aspen (Colorado, USA), 2002. – P. 575-582. – URI:, free (accessed 27.06.2022)
Abstract: To improve the thermal stability of Si/Sc multilayer mirrors, thin layers of W were deposited at interlayer boundaries. Using X-ray scattering and transmission electron microscopy, we studied the interaction of Si and Sc layers at elevated temperatures. It was shown that the W layers of 0.5-0.8 nm thickness form dense WSi2 barriers, which prevent a direct contact between Si and Sc and greatly slow down the formation of scandium silicides. Presented measurements show that Si/W/Sc/W multilayers fabricated by de-magnetron sputtering possess long thermal stability up to 250° C and the normal incidence reflectivity of 24 %.
Appears in Collections:Кафедра "Фізика металів і напівпровідників"

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