Malykhin, S. V.Makhlai, V. A.Surovitskiy, S. V.Garkusha, I. E.Herashchenko, S. S.Kondratenko, V. V.Kopylets, I. A.Zubarev, Evgeniy N.Borisova, S. S.Fedchenko, A. V.2021-08-112021-08-112020Behavior of the Ti-Zr-Ni thin film containing quasicrystalline and approximant phases under radiative-thermal action in transition modes / S. V. Malykhin [et al.] // Problems of atomic science and technology. – 2020. – No. 2 (126). – P. 3-8.https://repository.kpi.kharkov.ua/handle/KhPI-Press/53858X-ray diffraction and SEM microscopy were used to study the structural and phase changes in a thin film obtained by magnetron sputtering of a Ti52Zr30Ni18 target (at.%) on a steel substrate under the radiation-thermal influence of pulsed hydrogen plasma on an QSPA Kh-50 accelerator. A technique has been worked out for the formation of the quasicrystalline and crystal-approximant phases as a result of high-speed quenching using pulsed action with a heat load of 0.6 MJ/m². The changes in the contents of these phases as well as in their structure and substructure parameters were studied during isothermal vacuum annealing at a temperature of 550 °C and also as a result of irradiation with 5 plasma pulses in the range of heat load from 0.1 to 0.4 MJ/m². The quasicrystalline phase was found to be resistant to irradiation with hydrogen plasma.enradiative-thermal actionthin filmquasicrystalline phaseX-ray diffractionhydrogen plasmaheat loadArticle