Voronov, Dmitriy L.Zubarev, Evgeniy N.Kondratenko, Valeriy V.Penkov, Alexey V.Pershin, Yuriy P.Ponomarenko, Alexander G.Artioukov, Igor A.Vinogradov, Alexander V.Uspenskii, Yuriy A.2022-06-272022-06-272002Thermoresistive multilayer mirrors antidiffusion barriers for work at the wavelengths 40-50nm [Electronic resource] / Dmitriy L. Voronov [et al.] // AIP Conference Proceedings. – 2002. – Vol. 641.: 8th International Conference on X-Ray Lasers, Aspen, Colorado, 27-30 May 2002 / edited by J. J. Rocca [et al.]. – Electronic text data. – Aspen (Colorado, USA), 2002. – P. 575-582. – URI: https://www.researchgate.net/publication/228332102_Thermoresistive_multilayer_mirrors_with_antidiffusion_barriers_for_work_at_the_wavelengths_40-50_nm/link/0912f500400bd0457b000000/download, free (accessed 27.06.2022)https://repository.kpi.kharkov.ua/handle/KhPI-Press/57497To improve the thermal stability of Si/Sc multilayer mirrors, thin layers of W were deposited at interlayer boundaries. Using X-ray scattering and transmission electron microscopy, we studied the interaction of Si and Sc layers at elevated temperatures. It was shown that the W layers of 0.5-0.8 nm thickness form dense WSi2 barriers, which prevent a direct contact between Si and Sc and greatly slow down the formation of scandium silicides. Presented measurements show that Si/W/Sc/W multilayers fabricated by de-magnetron sputtering possess long thermal stability up to 250° C and the normal incidence reflectivity of 24 %.enthermal stability of Si/Scmultilayer mirrorsX-ray scatteringтермічнf стабільнsстm Si/Scбагатошарові дзеркалаpозсіювання рентгенівських променівThesisdoi.org/10.1063/1.1521079