Pershyn, Yuriy P.Gullikson, E. M.Artyukov, I. A.Kondratenko, V. V.Sevryukova, V. A.Voronov, D. L.Zubarev, Evgeniy N.Vinogradov, A. V.2014-03-122014-03-122011The influence of working gas pressure on interlayer mixing in magnetron-deposited Mo/Si multilayers / Y. P. Pershyn [et al.] // SPIE. – 2011. – Vol. 8139m. – P. 0N1-0N11.https://repository.kpi.kharkov.ua/handle/KhPI-Press/4716Impact of Ar gas pressure (1−4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering (l=0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayersenmultilayer X-ray mirrorinterlayer compositionpressure variationmagnetron sputteringArticle