(American Institute of Physics, 2011) Pershyn, Yuriy P.; Gullikson, E. M.; Artyukov, I. A.; Kondratenko, V. V.; Sevryukova, V. A.; Voronov, D. L.; Zubarev, Evgeniy N.; Vinogradov, A. V.
Impact of Ar gas pressure (1−4 mTorr) on the growth of amorphous interlayers in Mo/Si multilayers deposited by magnetron sputtering was investigated by small-angle x-ray scattering (l=0.154 nm) and methods of cross-sectional transmission electron microscopy. Some reduction of thickness of the amorphous inter-layers with Ar pressure increase was found, while composition of the layers was enriched with molybdenum. The interface modification resulted in raise of EUV reflectance of the Mo/Si multilayers
