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Документ Effect of Glow-discharge Hydrogen Plasma Treatment on Zinc Oxide Layers Prepared through Pulsed Electrochemical Deposition and via SILAR Method(Sumy State University, 2019) Klochko, N. P.; Klepikova, K. S.; Petrushenko, S. I.; Nikitin, A. V.; Kopach, V. R.; Khrypunova, I. V.; Zhadan, D. O.; Dukarov, S. V.; Lyubov, V. M.; Khrypunova, A. L.In this work, we investigated the effect of glow-discharge H₂⁺ plasma treatment on ZnO layers deposited on fluorine doped tin oxide (FTO) glass substrates through low temperature aqueous solution growth, namely, via a pulsed electrochemical deposition and by successive ionic layer adsorption and reaction (SILAR) technique. It is shown that the crystal structure, surface morphology, chemical composition and optical properties obtain some destructive changes after plasma processing due to the creation of oxygen vacancies Vo and H-related defects, and additionally, because of the zinc oxide etching by the glow-discharge H₂⁺ plasma through reduction of zinc oxide and evaporation of Zn from the surface. Neverthe-less, our investigations show quite good stability of the ZnO layers to the plasma-induced radiation and chemical impacts under high total H₂⁺ fluence received by every ZnO/FTO sample ~ 8·10¹⁸ cm⁻².Документ Structure, optical, electrical and thermoelectric properties of solution-processed Li-doped NiO films grown by SILAR(Elsevier Ltd, 2018) Klochko, N. P.; Klepikova, K. S.; Zhadan, D. O.; Petrushenko, S. I.; Kopach, V. R.; Khrypunov, G. S.; Lyubov, V. M.; Dukarov, S. V.; Nikitin, V. O.; Maslak, M. O.; Zakovorotniy, A. Yu.; Khrypunova, A. L.The article presents a new facial synthesis of Li-doped NiO films (NiO:Li) via an easy and cost-effective method Successive Ionic Layer Adsorption and Reaction (SILAR) with the processing of the obtained NiO films in a lithium-containing aqueous solution for their transformation after annealing into NiO:Li layers. Comparative analysis of crystal structure, optical, electrical and thermoelectric properties of the obtained NiO and NiO:Li 420-1050 nm thick films have reveiled a cubic rock-salt NiO structure, at that, NiO:Li samples are nanocrystalline single phased Li-NiO solid solutions. The fabricated NiO and NiO:Li films are p-type semiconductors with activation energy Ea = 0.1 eV and Ea = 0.25‒0.31 eV, respectively. The obtained in-plane Seebeck coefficients Z are in the range 0.20–0.33 mV/К. Notwithstanding the fact that the maximum values of the thermoelectric power factors P=2.2 μW/K2·m, are rather small, they were achieved if the hot end of the NiO:Li film was heated only to 115 °C. Thus, the produced in this work new low cost thermoelectric thin film material is suitable for a production of electrical energy for low-power devices due to absorption of low-potential heat.