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  • Ескіз
    Документ
    Growth and Structural Characterization of Thermally Evaporated Topological Insulator Bi2Se3 Thin Films
    (NanoCOFC, 2018) Rogachova, E. I.; Fedorov, A. G.; Krivonogov, S. I.; Mateychenko, P. V.; Dobrotvorskaya, M. V.; Garbuz, Alexander G.; Sipatov, A. Yu.
  • Ескіз
    Публікація
    Growth and structure of thermally evaporated Bi2Te3 thin films
    (Elsevier, 2016) Rogacheva, E. I.; Budnik, A. V.; Dobrotvorskaya, M. V.; Fedorov, A. G.; Krivonogov, S. I.; Mateychenko, P. V.; Nashchekina, O. N.; Sipatov, A. Yu.
    The growth mechanism, microstructure, and crystal structure of the polycrystalline nBi2Te3 thin films with thicknesses d = 15 – 350 nm, prepared by thermal evaporation in vacuum onto glass substrates, were studied. Bismuth telluride with Te excess was used as the initial material for the thin film preparation. The thin film characterization was performed using X-ray diffraction, X-ray photoelectron spectroscopy, energy-dispersive X-ray spectroscopy, scan electron microscopy, and electron force microscopy. It was established that the chemical composition of the prepared films corresponded rather well to the starting material composition and the films did not contain any phases apart from Bi2Te3. It was shown that the grain size and the film roughness increased with increasing film thickness. The preferential growth direction changed from [00l] to [015] under increasing d. The X-ray photoelectron spectroscopy studies showed that the thickness of the oxidized surface layer did not exceed 1.5 – 2.0 nm and practically did not change in the process of aging at room temperature, which is in agreement with the results reported earlier for single crystals. The obtained data show that using simple and inexpensive method of thermal evaporation in vacuum and appropriate technological parameters, one can grow n-Bi2Te3 thin films of a sufficiently high quality.
  • Ескіз
    Публікація
    Structure of thermally evaporated bismuth selenide thin films
    (Науково-технологічний комплекс "Інститут монокристалів", 2018) Rogacheva, E. I.; Fedorov, A. G.; Krivonogov, S. I.; Mateychenko, P. V.; Dobrotvorskay, M. V.; Garbuz, A. S.; Nashchekina, O. N.; Sipatov, A. Yu.
    The Bi₂Se₃ thin films with thicknesses d = 7-420 nm were grown by thermal evaporation in vacuum of stoichiometric n-Bi₂Se₃ crystals onto heated glass substrates under optimal technological conditions determined by the authors. The growth mechanism, microstructure, and crystal structure of the prepared thin films were studied using X-ray diffraction, scanning electron microscopy, energy-dispersive X-ray spectroscopy, X-ray photoelectron spectroscopy, and atomic force microscopy. It was established that the prepared thin films were polycrystalline, with composition close to the stoichiometric one, did not contain any phases apart from Bi₂Se₃, were of a high structural quality, and the preferential growth direction [001] corresponded to the direction of a trigonal axis C₃ in a hexagonal lattice. The films, like the initial crystal, exhibited n-type conductivity. It was shown that with increasing film thickness, the grain size and the film roughness remain practically the same at thicknesses d < 100 nm, and after that increase, reaching their saturation values at d ~ 300 nm. It follows from the results obtained in this work that using the method of thermal evaporation in vacuum from a single source, one can prepare thin n-Bi₂Se₃ films of a sufficiently high structural quality with a composition close to the stoichiometric one and the preferential growth orientation.
  • Ескіз
    Документ
    Size effects in chlorine doped PbSe thin films
    (Institute of Thermoelectricity, 2015) Menshikova, S. I.; Rogacheva, E. I.; Sipatov, A. Yu.; Krivonogov, S. I.; Matychenko, P. V.
    The possibility of obtaining strongly degenerate (≈ 3·10²⁰ сm⁻³) PbSe thin films (d = 5 – 220 nm) with n-type conductivity by thermal evaporation in vacuum of PbSe crystals doped with PbCl₂, with subsequent condensation onto (001) KCl substrates was established. It was shown that the films had high homogeneity degree, no grain structure was observed. The thickness dependences of thermoelectric properties (the Seebeck coefficient S, the Hall coefficient RH and the electric conductivity σ) of thin films were obtained. In the thickness range d ≈ 5 ÷ 30 nm, oscillation properties were observed with growth of d that are attributable to electron gas quantization. The calculation of S(d) dependence on the assumption of size quantization with regard to contribution of several subbands and the thickness dependence of the Fermi energy was shown to be in agreement with the experimental data. In the region of d > 30 nm there was growth of S and σ with thickness, which is attributable to manifestation of classical size effect and interpreted in the framework of Fuchs-Sondheimer and Mayer theories.