Thermoresistive multilayer mirrors antidiffusion barriers for work at the wavelengths 40-50nm

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dc.contributor.authorVoronov, Dmitriy L.en
dc.contributor.authorZubarev, Evgeniy N.en
dc.contributor.authorKondratenko, Valeriy V.en
dc.contributor.authorPenkov, Alexey V.en
dc.contributor.authorPershin, Yuriy P.en
dc.contributor.authorPonomarenko, Alexander G.en
dc.contributor.authorArtioukov, Igor A.en
dc.contributor.authorVinogradov, Alexander V.en
dc.contributor.authorUspenskii, Yuriy A.en
dc.date.accessioned2022-06-27T16:45:39Z
dc.date.available2022-06-27T16:45:39Z
dc.date.issued2002
dc.description.abstractTo improve the thermal stability of Si/Sc multilayer mirrors, thin layers of W were deposited at interlayer boundaries. Using X-ray scattering and transmission electron microscopy, we studied the interaction of Si and Sc layers at elevated temperatures. It was shown that the W layers of 0.5-0.8 nm thickness form dense WSi2 barriers, which prevent a direct contact between Si and Sc and greatly slow down the formation of scandium silicides. Presented measurements show that Si/W/Sc/W multilayers fabricated by de-magnetron sputtering possess long thermal stability up to 250° C and the normal incidence reflectivity of 24 %.en
dc.identifier.citationThermoresistive multilayer mirrors antidiffusion barriers for work at the wavelengths 40-50nm [Electronic resource] / Dmitriy L. Voronov [et al.] // AIP Conference Proceedings. – 2002. – Vol. 641.: 8th International Conference on X-Ray Lasers, Aspen, Colorado, 27-30 May 2002 / edited by J. J. Rocca [et al.]. – Electronic text data. – Aspen (Colorado, USA), 2002. – P. 575-582. – URI: https://www.researchgate.net/publication/228332102_Thermoresistive_multilayer_mirrors_with_antidiffusion_barriers_for_work_at_the_wavelengths_40-50_nm/link/0912f500400bd0457b000000/download, free (accessed 27.06.2022)en
dc.identifier.doidoi.org/10.1063/1.1521079
dc.identifier.urihttps://repository.kpi.kharkov.ua/handle/KhPI-Press/57497
dc.language.isoen
dc.publisherAmerican Institute of Physicsen
dc.subjectthermal stability of Si/Scen
dc.subjectmultilayer mirrorsen
dc.subjectX-ray scatteringen
dc.subjectтермічнf стабільнsстm Si/Scuk
dc.subjectбагатошарові дзеркалаuk
dc.subjectpозсіювання рентгенівських променівuk
dc.titleThermoresistive multilayer mirrors antidiffusion barriers for work at the wavelengths 40-50nmen
dc.typeThesisen

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