Объемные изменения и фазовые трансформации в тонкопленочных лазерных конденсатах никеля при отжиге

Abstract

The mechanisms of phase formation and structure transformations in films deposited with laser sputtering of Ni in vacuum and in oxygen atmosphere are investigated by transmission electron microscopy and electron diffraction. Following structure and phase states are shown to be formed in films depending on the oxygen pressure in the evaporation chamber and on the substrate temperature: amorphous Ni films, Ni films with metastable HCP crystal lattice, Ni films with stable FCC crystal lattice and oxide NiO films with FCC crystal lattice. The annealing of amorphous film initiates a phase transformation from amorphous state into crystalline one (with FCC crystal lattice) and relative density increasing 7.5%. The annealing of crystalline film with HCP structure initiates a phase transformation from HCP crystal lattice into FCC crystal lattice, relative density increasing 18.5% and nearly ten-multiple increasing of mean grain size.